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IGBT-AMB-SI3N4-Cu8.6oz-LS59mil/19mil-Ni118μ”-Au3.94μ”

  • Process: AMB (Active Metal Brazing)

  • Ceramic Material: Silicon Nitride (Si₃N₄)

  • Copper Thickness: 300 μm (11.81 mil / 8.62 oz/ft²)

  • Line Width / Line Spacing: 1.5 mm / 0.5 mm (59.06 mil / 19.69 mil)

  • Surface Finish: Nickel 3 μm (118.1 μin) + Gold 0.1 μm (3.94 μin)

  • Thermal Conductivity: >90 W/m·K (0.9 W/cm·K)

  • Fracture Toughness: >6.5 MPa·m¹ᐟ² (>5.91 ksi·in¹ᐟ²)

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This IGBT power substrate is manufactured using Active Metal Brazing (AMB) technology with a silicon nitride (Si₃N₄) ceramic base. It offers exceptional mechanical strength, high thermal conductivity, and excellent electrical insulation, making it ideal for handling high current loads in harsh operating environments.

The substrate features a 300 μm (11.81 mil / 8.62 oz/ft²) thick copper layer that enables stable and efficient power transmission. With a minimum line width of 1.5 mm (59.06 mil) and a minimum spacing of 0.5 mm (19.69 mil), it supports compact circuit layouts—perfect for high-density module packaging.

The copper surface is plated with 3 μm (118.1 μin) of nickel and 0.1 μm (3.94 μin) of gold, ensuring excellent oxidation resistance, solderability, and long-term reliability under thermal cycling condition