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PWR-AMB-SI3N4-Cu8.5 oz-LS39.37 mil/118 mil-Ni118 mil-Au1.97μ”

    • Process: AMB (Active Metal Brazing)

    • Ceramic Material: Silicon Nitride (Si₃N₄)

    • Copper Thickness: 300 μm (11.81 mil / 8.62 oz/ft²)

    • Line Width / Line Spacing: 1.0 mm / 3.0 mm

    • Surface Finish:

      • Nickel: 3 μm (118.1 μin)

      • Gold: 0.05 μm (1.97 μin)

    • Dielectric Withstand Voltage: 10,000V (10 kV)

    • Thermal Conductivity (Si₃N₄): ~90 W/m·K (0.9 W/cm·K)

    • Mechanical Strength: >800 MPa (8×10⁸ Pa / ~8158 kgf/cm² / ~116,030 PSI)

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This miniature IGBT power substrate is manufactured using Active Metal Brazing (AMB) technology on silicon nitride (Si₃N₄) ceramic, offering outstanding thermal conductivity (~90 W/m·K), exceptional mechanical strength (>800 MPa or approximately 116,000 psi), and excellent electrical insulation. It is specifically engineered for compact IGBT modules and high-voltage power electronics applications.

The substrate features a 300 μm (0.3 mm / 11.81 mil / 11,811 μin / ~8.5 oz/ft²) copper layer, with a minimum line width of 1.0 mm (1000 μm / 39.37 mil / 0.0394 inch) and minimum line spacing of 3.0 mm (3000 μm / 118.11 mil / 0.1181 inch). This design ensures compliance with high-voltage isolation standards while maintaining current integrity.

The copper surface is plated with 3 μm (118.11 μin) of nickel and 0.05 μm (1.97 μin) of gold, providing excellent corrosion resistance, solderability, and wire bonding performance. With a dielectric withstand voltage of up to 10,000V, this substrate is well-suited for demanding electrical environments.